ROCESS FOR INDIUM OR INDIUM ALLOY DEPOSITION

The present invention deals with a process for deposition of indium or indium alloys and an article obtained by the process, wherein the process comprises the steps * i. providing a substrate having at least one metal or metal alloy surface; * ii. depositing a first indium or indium alloy layer on a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	VAZHENIN, Grigory, SPERLING, Jan, CASTELLANI, Mauro, KIRBS, Andreas, ROHDE, Dirk, PIEPER, Stefan
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention deals with a process for deposition of indium or indium alloys and an article obtained by the process, wherein the process comprises the steps * i. providing a substrate having at least one metal or metal alloy surface; * ii. depositing a first indium or indium alloy layer on at least one portion of said surface whereby a composed phase layer is formed of a part of the metal or metal alloy surface and a part of the first indium or indium alloy layer; * iii. removing partially or wholly the part of the first indium or indium alloy layer which has not been formed into the composed phase layer; * iv. depositing a second indium or indium alloy layer on the at least one portion of the surface obtained in step iii. * v.