METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising: obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at a plurality of points on the substrate; decomposing the parame...
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| creator | COTTAAR, Jeroen HENKE, Wolfgang, Helmut QUEENS, Rene, Marinus, Gerardus, Johan DONKERBROEK, Arend, Johannes |
| description | A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising:
obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at a plurality of points on the substrate;
decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations;
determining a scale factor to correct for errors in measurement of the parameter; and
controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3358415A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3358415A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3358415A13</originalsourceid><addsrcrecordid>eNrjZEjzdQ3x8HcJVnDzD1Jw9vcLCfL38fH0c1fw8QSKuwc5Bnh4Ois4BgQ4BjmGhAbr4BBXcPRzUXBxDfN0dlXwdfQLdXN0DgkNApkDMZ-HgTUtMac4lRdKczMouLmGOHvophbkx6cWFyQmp-allsS7Bhgbm1qYGJo6GhoToQQAjog1Fw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>COTTAAR, Jeroen ; HENKE, Wolfgang, Helmut ; QUEENS, Rene, Marinus, Gerardus, Johan ; DONKERBROEK, Arend, Johannes</creator><creatorcontrib>COTTAAR, Jeroen ; HENKE, Wolfgang, Helmut ; QUEENS, Rene, Marinus, Gerardus, Johan ; DONKERBROEK, Arend, Johannes</creatorcontrib><description>A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising:
obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at a plurality of points on the substrate;
decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations;
determining a scale factor to correct for errors in measurement of the parameter; and
controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180808&DB=EPODOC&CC=EP&NR=3358415A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180808&DB=EPODOC&CC=EP&NR=3358415A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>COTTAAR, Jeroen</creatorcontrib><creatorcontrib>HENKE, Wolfgang, Helmut</creatorcontrib><creatorcontrib>QUEENS, Rene, Marinus, Gerardus, Johan</creatorcontrib><creatorcontrib>DONKERBROEK, Arend, Johannes</creatorcontrib><title>METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><description>A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising:
obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at a plurality of points on the substrate;
decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations;
determining a scale factor to correct for errors in measurement of the parameter; and
controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEjzdQ3x8HcJVnDzD1Jw9vcLCfL38fH0c1fw8QSKuwc5Bnh4Ois4BgQ4BjmGhAbr4BBXcPRzUXBxDfN0dlXwdfQLdXN0DgkNApkDMZ-HgTUtMac4lRdKczMouLmGOHvophbkx6cWFyQmp-allsS7Bhgbm1qYGJo6GhoToQQAjog1Fw</recordid><startdate>20180808</startdate><enddate>20180808</enddate><creator>COTTAAR, Jeroen</creator><creator>HENKE, Wolfgang, Helmut</creator><creator>QUEENS, Rene, Marinus, Gerardus, Johan</creator><creator>DONKERBROEK, Arend, Johannes</creator><scope>EVB</scope></search><sort><creationdate>20180808</creationdate><title>METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><author>COTTAAR, Jeroen ; HENKE, Wolfgang, Helmut ; QUEENS, Rene, Marinus, Gerardus, Johan ; DONKERBROEK, Arend, Johannes</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3358415A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>COTTAAR, Jeroen</creatorcontrib><creatorcontrib>HENKE, Wolfgang, Helmut</creatorcontrib><creatorcontrib>QUEENS, Rene, Marinus, Gerardus, Johan</creatorcontrib><creatorcontrib>DONKERBROEK, Arend, Johannes</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>COTTAAR, Jeroen</au><au>HENKE, Wolfgang, Helmut</au><au>QUEENS, Rene, Marinus, Gerardus, Johan</au><au>DONKERBROEK, Arend, Johannes</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><date>2018-08-08</date><risdate>2018</risdate><abstract>A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising:
obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at a plurality of points on the substrate;
decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations;
determining a scale factor to correct for errors in measurement of the parameter; and
controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
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