METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising: obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at a plurality of points on the substrate; decomposing the parame...

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Bibliographische Detailangaben
Hauptverfasser:	COTTAAR, Jeroen, HENKE, Wolfgang, Helmut, QUEENS, Rene, Marinus, Gerardus, Johan, DONKERBROEK, Arend, Johannes
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising: obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at a plurality of points on the substrate; decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations; determining a scale factor to correct for errors in measurement of the parameter; and controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate.