WAFER WASHING METHOD, AND LIQUID CHEMICAL USED IN SAME

[Object] To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. [Solution] A liquid chemical is used, which includes: an alkoxysilane represented by the fol...

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Bibliographische Detailangaben

Hauptverfasser:	WATANABE, Shota, IMACHI, Masayoshi, SAIO, Takashi, ABE, Kazuyuki, TAKATA, Tomohiro, FUKUI, Yuki, OKUMURA, Yuzo, FUKAZAWA, Hiroki, KUMON, Soichi
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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