WAFER WASHING METHOD, AND LIQUID CHEMICAL USED IN SAME

[Object] To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. [Solution] A liquid chemical is used, which includes: an alkoxysilane represented by the fol...

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Bibliographische Detailangaben
Hauptverfasser:	WATANABE, Shota, IMACHI, Masayoshi, SAIO, Takashi, ABE, Kazuyuki, TAKATA, Tomohiro, FUKUI, Yuki, OKUMURA, Yuzo, FUKAZAWA, Hiroki, KUMON, Soichi
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	[Object] To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. [Solution] A liquid chemical is used, which includes: an alkoxysilane represented by the following general formula [1]; at least one kind selected from the group consisting of a sulfonic acid represented by the following general formula [2], an anhydride of the sulfonic acid, a salt of the sulfonic acid and a sulfonic acid derivative represented by the following general formula [3]; and a diluent solvent containing at least one kind selected from the group consisting of a hydrocarbon, an ether and a thiol. (R 1 ) a Si(H) b (OR 2 ) 4- a - b [1] R 3 -S(=O) 2 OH[2] R 3 -S(=O) 2 O-Si(H) 3- c (R 4 ) c [3]