MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

The invention relates to a mirror, in particular for a microlithographic projection exposure apparatus. A mirror (10, 30) according to the invention comprises an optical active surface (11, 31), a mirror substrate (12, 32), a reflection layer stack (21, 41) for reflecting electromagnetic radiation incident on the optical active surface, and at least one piezoelectric layer (16, 36) which is arranged between the mirror substrate and the reflection layer stack and which can be applied by an electric field in order to create a locally variable deformation, via a first electrode arrangement (20, 40) located on the side of the piezoelectric layer facing the reflection layer stack, and a second electrode arrangement (14, 34), located on the side of the piezoelectric layer facing the mirror substrate, wherein the first electrode arrangement and/or the second electrode arrangement comprises a plurality of electrodes (20a, 20b, 20c,..., 40a, 40b, 40c,... ), which can each be applied via a line (19a, 19b, 19c,..., 39a, 39b, 39c,... ) with an electrical voltage with respect to the respective other electrode arrangement, wherein a shielding layer (22, 42) made from electrically conductive material is further arranged in such a way as to at least partially shield the piezoelectric layer from the electrical field generated by said lines.