AN OVERLAY MEASUREMENT METHOD AND APPARATUS

An apparatus for detecting a mark having first and second stripe groups on a substrate includes a detection module moveable over a surface of the substrate. The detection module includes a detection unit and a positioning unit configured to align the detection unit with the mark. The detection unit...

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Bibliographische Detailangaben
Hauptverfasser:	HE, Shifeng, LIU, Jianyao, LIU, Xuan, WU, Qiang
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An apparatus for detecting a mark having first and second stripe groups on a substrate includes a detection module moveable over a surface of the substrate. The detection module includes a detection unit and a positioning unit configured to align the detection unit with the mark. The detection unit is configured to obtain data of the mark and operative to perform repeated acquisition operations on the first and second stripe groups of the mark. Each of the acquisition operations acquires data associated with the first stripe group or the second stripe group. The apparatus also includes a processing module configured to determine a positional deviation between the first stripe group and the second stripe group in response to the obtained data of the mark and data associated with a motion of the detection module.