IMPRINT MOLD AND MANUFACTURING METHOD OF THE SAME

IMPRINT MOLD AND MANUFACTURING METHOD OF THE SAME

An imprint mold includes a substrate; a pattern on the substrate and having a multi-layered structure; and an etch stop layer between an upper layer and a lower layer of the pattern.

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Bibliographische Detailangaben
Hauptverfasser: CHOI, Sung-Woo, KIM, Chul-Ho, KOOK, Yun-Ho
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:An imprint mold includes a substrate; a pattern on the substrate and having a multi-layered structure; and an etch stop layer between an upper layer and a lower layer of the pattern.