METHOD, MEASUREMENT PROBE AND MEASUREMENT SYSTEM FOR DETERMINING PLASMA CHARACTERISTICS

The invention relates to a method and a device for determining plasma characteristics, the method comprising the steps of: - arranging a measurement probe (2) having a self-inductance in proximity to a plasma (3) to establish inductive coupling between the plasma (3) and the measurement probe (2); -...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HOWLING, Alan, FURNO, Ivo, GUITTIENNE, Philippe
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The invention relates to a method and a device for determining plasma characteristics, the method comprising the steps of: - arranging a measurement probe (2) having a self-inductance in proximity to a plasma (3) to establish inductive coupling between the plasma (3) and the measurement probe (2); - determining a mutual inductance (Mprobe/plasma) between the measurement probe (2) and the plasma (3); - depending on the mutual inductance (Mprobe/plasma), estimating a quantity representing the plasma complex conductivity (σ); and - deriving at least one plasma parameter from the plasma complex conductivity (σ).