LAMINATE AND METHOD OF MANUFACTURING SAME, AND GAS BARRIER FILM AND METHOD OF MANUFACTURING SAME

The present invention provides a laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate (11) made a polymer material...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KOYAMA, Hiroshi, SATO, Jin, KANO, Mitsuru
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The present invention provides a laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate (11) made a polymer material; an undercoat layer (12) disposed on at least part of a surface (11a) of the substrate (11) and made up of an inorganic material containing Ta; and an atomic layer deposition film (13) disposed so as to cover a surface (12a) of the undercoat layer (12).