PROCESS FOR DRYING HCFO-1233zd

Disclosed is a process to dry 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd) or its mixtures by washing with water and or alkaline solution. The resulting liquid mixture, containing HCFO-1233zd, other organic, and water, is allowed to settle, and thereafter, the lighter water layer is decanted off fr...

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Bibliographische Detailangaben
Hauptverfasser: COTTRELL, Stephen A, CHIU, Yuon
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Disclosed is a process to dry 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd) or its mixtures by washing with water and or alkaline solution. The resulting liquid mixture, containing HCFO-1233zd, other organic, and water, is allowed to settle, and thereafter, the lighter water layer is decanted off from the top of the mixture. The heavier HCFO-1233zd layer is then withdrawn from the bottom of the decanter to a desiccant dryer (e.g., molecular sieve, activated alumina, silica gel, and the like) to further remove the residual soluble moisture from the HCFO-1233zd to about 80 ppm or less.