VACUUM DEPOSITION METHOD

Provided is a method of vacuum deposition to deposit at least two functional coatings to a substrate, including (a) evaporating a first film forming material from a first evaporation source disposed in a vacuum deposition chamber, (b) depositing the evaporated first film forming material on a substr...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MAKSOUD, Cesar, JACOBS, Todd Lane, MACCRADY, Brian, MATHIEU, Alain
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Provided is a method of vacuum deposition to deposit at least two functional coatings to a substrate, including (a) evaporating a first film forming material from a first evaporation source disposed in a vacuum deposition chamber, (b) depositing the evaporated first film forming material on a substrate located above the first evaporation source to form at least a portion of an anti-reflective coating on the substrate, (c) evaporating a second film forming material from a second evaporating source disposed in the vacuum deposition chamber, and (d) depositing the evaporated second film forming materials on the substrate located above the second evaporation source to form a hydrophobic coating on the substrate.