PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND

Provided are a photosensitive resin composition which enables production of a planographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a planographic printing plate having excellent chemical resistance an...

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Bibliographische Detailangaben
1. Verfasser:	NOZAKI Atsuyasu
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Provided are a photosensitive resin composition which enables production of a planographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a planographic printing plate having excellent chemical resistance and excellent printing durability, a planographic printing plate precursor obtained by using the photosensitive resin composition, a method for producing a planographic printing plate, and a new polymer compound. The photosensitive resin composition of the present invention contains a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain; and an infrared absorbent.