METHOD OF DETECTING AN ARC OCCURRING DURING THE POWER SUPPLY OF A PLASMA PROCESS, CONTROL UNIT FOR A PLASMA POWER SUPPLY, AND PLASMA POWER SUPPLY
A plasma power supply (10) for supplying a plasma process in a plasma chamber(30) with a power comprises: a. a DC-Source (15); b. an output signal generator (16) connected to the DC source (15); c. a first signal sequence measurement device (20) for measuring a signal sequence present between the DC...
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| Format: | Patent |
| Sprache: | eng ; fre ; ger |
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| Zusammenfassung: | A plasma power supply (10) for supplying a plasma process in a plasma chamber(30) with a power comprises:
a. a DC-Source (15);
b. an output signal generator (16) connected to the DC source (15);
c. a first signal sequence measurement device (20) for measuring a signal sequence present between the DC source (15) and the output signal generator (16);
d. a second signal sequence measurement device (18, 19) for measuring a signal sequence present at the output of the output signal generator (16);
f. a control unit (14), which is connected to the first and second signal sequence measurement devices (18, 19, 20). |
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