FILTER DEVICE TO REMOVE PARTICLES FROM A VAPOUR STREAM

A filter device for reducing the amount of non-vaporous components in a vapour stream, including a carbon foam as filter material capable of being penetrated by the vapour stream and arranged in such a way that the only route for the vapour stream to pass the carbon foam is via penetration of the ca...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ZOESTBERGEN, Edzo, COMMANDEUR, Colin, BURTON, Daniel Brian, MAALMAN, Theodorus Franciscus Jozef, BEENTJES, Petrus Cornelis Jozef
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A filter device for reducing the amount of non-vaporous components in a vapour stream, including a carbon foam as filter material capable of being penetrated by the vapour stream and arranged in such a way that the only route for the vapour stream to pass the carbon foam is via penetration of the carbon foam. The device is in particular suitable for coating a substrate by physical vapour deposition of the vapour. The homogenous and single phase vapour stream produced by the filter device results in a smooth coated substrate wherein splashes are virtually absent.