METHOD FOR PRODUCING CHLORINATED OLIGOSILANES

The present invention relates to a process for preparing chlorinated oligosilanes, wherein chlorinated polysilane having an empirical formula of SiCl1.0-2.8 and/or a mixture comprising the chlorinated polysilane is reacted with elemental chlorine or a chlorine-containing mixture. Additionally claime...

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Bibliographische Detailangaben
Hauptverfasser:	MOHSSENI, Javad, AUNER, Norbert, HOLL, Sven, BAUCH, Christian
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOUNDS THEREOF CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES INKS INORGANIC CHEMISTRY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-METALLIC ELEMENTS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL POLISHES SEMICONDUCTOR DEVICES SEPARATION THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	The present invention relates to a process for preparing chlorinated oligosilanes, wherein chlorinated polysilane having an empirical formula of SiCl1.0-2.8 and/or a mixture comprising the chlorinated polysilane is reacted with elemental chlorine or a chlorine-containing mixture. Additionally claimed are chlorinated oligosilanes prepared by the process and the use thereof for production of semiconductors and/or hard coatings.