DUAL-BEAM CHARGED PARTICLE APPARATUS WITH ANTI-CONTAMINATION SHIELD

Disclosed herein is a composite charged particle beam apparatus including a sample tray 15 on which a sample S is placed; a focused ion beam column 11 irradiating the sample by using a focused ion beam; an electron beam column 12 irradiating the sample by using an electron beam; a sample chamber rec...

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Bibliographische Detailangaben
Hauptverfasser: OONISHI, Tsuyoshi, HASUDA, Masakatsu
Format: Patent
Sprache:eng ; fre ; ger
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