DUAL-BEAM CHARGED PARTICLE APPARATUS WITH ANTI-CONTAMINATION SHIELD

Disclosed herein is a composite charged particle beam apparatus including a sample tray 15 on which a sample S is placed; a focused ion beam column 11 irradiating the sample by using a focused ion beam; an electron beam column 12 irradiating the sample by using an electron beam; a sample chamber receiving the sample tray, and the columns therein; an anti-contamination plate 22 moving between an inserted position inserted into a space between a beam emission surface 12a of the electron beam column and the sample tray, thus preventing the electron beam column from being contaminated by sputtered particles M, and an open position withdrawn from the space between the beam emission surface and the sample tray; and an operation unit operating the anti-contamination plate to move between the positions.