PLASMA PROCESS AND REACTOR FOR THE THERMOCHEMICAL TREATMENT OF THE SURFACE OF METALLIC PIECES

The reactor (R) has a reaction chamber (RC) provided with a support (S) for the metallic pieces (1) and with a system of an anode (2), connected to a ground (2b), and of a cathode system (3) connected to the support (S) and to a pulsating DC power supply (10). In the reaction chamber (RC), which is...

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Bibliographische Detailangaben
Hauptverfasser:	KLEIN, Aloisio Nelmo, BERNARDELLI, Euclides Alexandre, BINDER, Roberto, LAMIM, Thiago De Souza, HAMMES, Gisele, BINDER, Cristiano
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The reactor (R) has a reaction chamber (RC) provided with a support (S) for the metallic pieces (1) and with a system of an anode (2), connected to a ground (2b), and of a cathode system (3) connected to the support (S) and to a pulsating DC power supply (10). In the reaction chamber (RC), which is heated and supplied with a gas load is formed, by means of an electric discharge in the cathode (3), a gas plasma. A liquid or gas precursor is admitted in at least one tubular cracking chamber (20) associated with a high voltage energy source (30). It may be provided at least one tubular sputtering chamber (40) associated with an electric power supply (50) receiving a solid precursor. A potential difference is applied between the anode (2) and one and/or other of said tubular chambers (20, 40), in order to release the alloy elements to be ionically bombarded against the metallic pieces (1), either simultaneously or individually and in any order.