1-ACYLGUANIDINE COMPOUNDS AND THE USE OF SAID COMPOUNDS IN ELECTROLESS DEPOSITION OF NICKEL AND NICKEL ALLOY COATINGS

The invention relates to an aqueous plating bath composition for electroless deposition of nickel or a nickel alloy, the composition comprising: (i) a source of nickel ions, wherein the aqueous plating bath composition further comprises (ii) at least one accelerating compound which is a 1-acylguanid...

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Bibliographische Detailangaben
Hauptverfasser:	Brunner, Dr. Heiko, Pape, Simon, Bejan, Dr. Iulia
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to an aqueous plating bath composition for electroless deposition of nickel or a nickel alloy, the composition comprising: (i) a source of nickel ions, wherein the aqueous plating bath composition further comprises (ii) at least one accelerating compound which is a 1-acylguanidine compound having general chemical formula I, wherein R 1 is selected from the group comprising alkyl and aryl; R 2 is a radical having general chemical formula -R 4 -SO 3 M, wherein R 4 is selected from the group comprising alkylene and arylene; wherein M is hydrogen or a metal atom or any other cation forming radical having a valency of one or is an M th fraction of a metal atom or any other cation forming radical having a valency of m, wherein m is 2 or 3; R 3 is selected from the group comprising -Hal, -OR 5 , and -NR 5 R 6 , wherein R 5 , R 6 are independently selected from the group comprising hydrogen, alkyl and aryl; and n is an integer ranging from 1 to 5.