METHOD AND SYSTEM FOR CONVERGENT POLISHING

A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WONG, Lana L, DYLLA-SPEARS, Rebecca J, STEELE, William A, DESJARDIN, Richard P, GERAGHTY, Paul, BUDE, Jeffrey D, SURATWALA, Tayyab I, FEIT, Michael D, MILLER, Philip E, MASON, Daniel C
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	A method of mounting a workpiece to a substrate is disclosed, the method comprising: determining a peak-to-valley height value; determining a value related to pitch area; computing a relative area of pitch; computing a button radius; computing a number of pitch buttons; coupling the computed number, N, of pitch buttons to the workpiece; and coupling the N pitch buttons to the substrate. Also disclosed is a slurry system for polishing an optical element, the slurry system comprising: a solvent; an abrasive component supported in the solvent; and a surfactant supported in the solvent.