METHOD FOR SUPRESSING GAS EMISSIONS OUT OF POROUS PARTICLES

A process is disclosed for limiting the emissions of gases from a porous material in the form of particles comprising a porous inorganic support and at least 0.1% by weight of one or more compounds chosen from organic compounds, halogen compounds, boron compounds and phosphorus compounds. The partic...

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Bibliographische Detailangaben
Hauptverfasser: DUFRESNE, Pierre, BAFFERT, Mathieu, LABOULFIE, Fabien, GALLIOU, Pauline
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A process is disclosed for limiting the emissions of gases from a porous material in the form of particles comprising a porous inorganic support and at least 0.1% by weight of one or more compounds chosen from organic compounds, halogen compounds, boron compounds and phosphorus compounds. The particles are placed in motion within a hot gas stream traversing them, and a liquid composition containing one or more film-forming polymer(s) is sprayed over the moving particles by means of a twin-fluid atomization nozzle, in which the liquid composition is mixed with a pressurized gas, with a relative atomization pressure of greater than or equal to 0.7×1005 Pa, until a protective layer containing the film-forming polymer(s) and exhibiting a mean thickness of less than or equal to 20 μm is obtained on the surface of the said particles. A material resulting from this process is also disclosed.