AUTOMATIC LOCALIZED SUBSTRATE ANALYSIS DEVICE AND ANALYSIS METHOD

An object of the present invention is to provide an analysis apparatus in which local analysis of a substrate with ICP-MS is automated. The present invention relates to an automatic analysis apparatus for a local region of a substrate, including: a nozzle for local analysis having: analysis-liquid s...

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Bibliographische Detailangaben
Hauptverfasser: KAWABATA, Katsuhiko, ICHINOSE, Tatsuya, IMAI, Toshihiko
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:An object of the present invention is to provide an analysis apparatus in which local analysis of a substrate with ICP-MS is automated. The present invention relates to an automatic analysis apparatus for a local region of a substrate, including: a nozzle for local analysis having: analysis-liquid supply means that ejects analysis liquid onto a substrate; analysis-liquid discharge means that takes the analysis liquid including an object to be analyzed from the substrate into the nozzle to feed the analysis liquid to a nebulizer; and exhaust means including an exhaust channel in the nozzle; automatic liquid-feed means that automatically feeds the collected analysis liquid to ICP-MS; flow adjustment means that adjusts the flow of the analysis liquid; and automatic control means that simultaneously performs local analysis and analysis of the object to be analyzed with the ICP-MS to perform automatic analysis to a plurality of adjacent predetermined regions, successively.