IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a...

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Bibliographische Detailangaben
Hauptverfasser:	SMEETS, Bart, BOUMAN, Willem, Jan, POLET, Theodorus, Wilhelmus, BASELMANS, Johannes, Jacobus, Matheus, MODDERMAN, Theodorus, Marinus, VAN DER HAM, Ronald, ROPS, Cornelius, Maria, STEFFENS, Koen, LEMPENS, Han, Henricus, Aldegonda
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.