LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING A LITHOGRAPHIC APPARATUS

A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specifi...

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Bibliographische Detailangaben
Hauptverfasser:	CORTIE, Rogier, Hendrikus, Magdalena, JEUNINK, Andre, Bernardus, OVERKAMP, Jim, Vincent, VY, Van, Vuong, KOEVOETS, Adrianus, Hendrik, TROMP, Siegfried, Alexander, BERENDSEN, Christianus, Wilhelmus, Johannes, AUDENAERDT, Daniel, Elza, Roeland
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.