METHOD FOR APPLYING ADHESIVES IN PATTERNS TO AN ADVANCING SUBSTRATE

The present disclosure involves methods and apparatuses for applying fluids onto an advancing substrate having an unconstrained caliper, Hs. The fluid application apparatus may include a slot die applicator and a substrate carrier, wherein the slot die applicator includes a slot opening, a first lip...

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Bibliographische Detailangaben
Hauptverfasser:	BROWN, Darrell, Ian, KAWKA, Paul, Anthony
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BANDAGES, DRESSINGS OR ABSORBENT PADS DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF,TUBULAR STRUCTURES OF THE BODY, E.G. STENTS FILTERS IMPLANTABLE INTO BLOOD VESSELS FIRST-AID KITS FOMENTATION HUMAN NECESSITIES HYGIENE LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MEDICAL OR VETERINARY SCIENCE ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL PROSTHESES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING TREATMENT OR PROTECTION OF EYES OR EARS
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Beschreibung
Zusammenfassung:	The present disclosure involves methods and apparatuses for applying fluids onto an advancing substrate having an unconstrained caliper, Hs. The fluid application apparatus may include a slot die applicator and a substrate carrier, wherein the slot die applicator includes a slot opening, a first lip, and a second lip, the slot opening located between the first lip and the second lip. And the substrate carrier includes a base surface and a pattern element that includes a pattern surface and protrudes outward from the base surface. The substrate carrier is positioned adjacent the slot die applicator to define a minimum distance, Hg, between the pattern surface of the pattern element and the first lip and the second lip that is less than the unconstrained caliper, Hs, of the substrate. Embodiments of apparatuses may be configured to monitor; establish; maintain; and/or change the desired minimum distance, Hg, before and/or during operation.