SEMICONDUCTOR LASER ELEMENT

A semiconductor laser device includes a well layer and a barrier layer formed of a III-V group semiconductor crystal containing As as a primary component. A V group element other than As has been introduced at a concentration of 0.02 to 5% into a V group site of the III-V group semiconductor crystal...

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Bibliographische Detailangaben
Hauptverfasser: ISHIKAWA, Takuya, IWAMI, Masayuki, MATSUDA, Takeyoshi, KAWAKITA, Yasumasa, IWAI, Norihiro, ISHII, Hirotatsu, KASUKAWA, Akihiko, KAJI, Eisaku
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A semiconductor laser device includes a well layer and a barrier layer formed of a III-V group semiconductor crystal containing As as a primary component. A V group element other than As has been introduced at a concentration of 0.02 to 5% into a V group site of the III-V group semiconductor crystal in at least one of the well layer and the barrier layer. A III group site of the III-V group semiconductor crystal in at least one of the well layer and the barrier layer contains Al. A semiconductor laser device suppressing generation of defects in a bulk of a semiconductor crystal and having less variation of characteristics is thereby provided.