DEVICE FOR PRODUCING A PATCH OF A LAYER ON A SUBSTRATE AND MEASURING THE THICKNESS OF THE PATCH AND METHOD OF MEASURING A THICKNESS OF A PATCH OF A LAYER STRUCTURE ON A SUBSTRATE

The invention relates to a thickness measurement device (1) for and a method of measuring a thickness of a patch (2) of a layer structure on a substrate (3), in particular a functional area (102) of an electric element (104), and a device for producing a patch (2) of a layer structure on a substrate (3). In order to provide a solution that allows a fast measurement of the thickness (T), a thickness measurement device (1) for measuring a thickness (T) of patch of a layer structure on a substrate, in particular a functional area (102) of an electric element (104), comprises an electron source (8) for emitting an electron beam (4), an electron acceleration device (9) for accelerating the electrons in the electron beam (4), a detector (5) for detecting a signal (6) coming from the patch (2) that is subjected to the electron beam (4), the thickness measurement device (1) being adapted to move the patch (2) and the electron beam (4) relative to each other, wherein an analyzing device (7) is provided for determining the thickness (T) of the patch (2). Further disclosed is a method of measuring a thickness (T) of a patch (2) of a layer structure on a substrate (3), in particular a functional area (102) of an electric element (104), wherein an electron beam (4) is emitted, accelerated and directed to the patch (2), wherein the patch (2) is moved relative to the electron beam (4), a signal (6) coming from the patch (2) is detected and the thickness (T) of the patch (2) is determined.