SILICON-BASED PART WITH AT LEAST ONE CHAMFER AND METHOD FOR MANUFACTURING SAME

The invention relates to a silicon-based component with at least one chamfer formed from a method combining at least one oblique side wall etching step with a "Bosch" etching of vertical side walls, thereby enabling aesthetic improvement and improvement in the mechanical strength of compon...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: Gandelhman, Alex
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The invention relates to a silicon-based component with at least one chamfer formed from a method combining at least one oblique side wall etching step with a "Bosch" etching of vertical side walls, thereby enabling aesthetic improvement and improvement in the mechanical strength of components formed by micromachining a silicon-based wafer.