LOW EXPANSION SILICA-TITANIA ARTICLES WITH A TZC GRADIENT BY COMPOSITIONAL VARIATION

A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100−{c+f(x,y,z)}−δ(...

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Bibliographische Detailangaben
Hauptverfasser:	ANNAMALAI, Sezhian, DURAN, Carlos Alberto, ANGELL, William R, IV, MAXON, John Edward
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY GLASS HOLOGRAPHY JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100−{c+f(x,y,z)}−δ(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and δ(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).