SKIN CLEANSING COMPOSITION WITH A DEPOSITION COMPONENT

Materials and apparatus are provided for a skin cleaning composition with a cationic deposition component. The skin cleaning composition includes a keratolytic skin peeling ingredient. The skin cleaning composition further includes at least one surfactant. The skin cleaning composition further inclu...

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Hauptverfasser: VAZQUEZ-ALVAREZ, Terannie, LUCIOW, Chris
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Materials and apparatus are provided for a skin cleaning composition with a cationic deposition component. The skin cleaning composition includes a keratolytic skin peeling ingredient. The skin cleaning composition further includes at least one surfactant. The skin cleaning composition further includes a cationic deposition component to enhance deposition of the keratolytic skin peeling ingredient onto the skin.