METHOD AND APPARATUS FOR CONTROLLING THE COMPOSITION OF LIQUID METAL IN AN EVAPORATOR DEVICE

An apparatus and method for controlling the composition of liquid metal fed to an evaporator in a vacuum chamber used in a physical vapor deposition process.

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Bibliographische Detailangaben
Hauptverfasser:	MAALMAN, THEODORUS, FRANCISCUS, JOZEF, VAN DE LANGKRUIS, JÖRGEN, ZOESTBERGEN, EDZO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	An apparatus and method for controlling the composition of liquid metal fed to an evaporator in a vacuum chamber used in a physical vapor deposition process.