THIN-FILM RESONATOR MANUFACTURING METHOD AND DEVICE

Provided are a method and device for manufacturing a film resonator. The manufacturing method includes that: a thickness of each film layer which has been deposited is detected; when the detected thickness of any film layer which has been deposited is not in a standard thickness range, it is judged whether a mass loading layer has been deposited, and when the mass loading layer has not been deposited, at least one film layer which has not been deposited is selected for thickness compensation, and according to a compensated thickness of the selected at least one film layer which has not been deposited and a target frequency offset, a thickness of the mass loading layer required for generating the target frequency offset is calculated, wherein the standard thickness range is determined by a target frequency and a process production capacity of the resonator; subsequent film deposition is conducted according to the compensated thickness of the selected at least one film layer which has not been deposited and the calculated thickness of the mass loading layer. The manufacturing method and device can accurately generate the required frequency offset, thereby improving the yield rate of products.