LIQUID FLOW CONTROL FOR FILM DEPOSITION

A method for controlling liquid flow through an apparatus comprising an orifice (245) and an adjacent flexible diaphragm (220) separated from each other by a gap (225) through which a liquid flows, the orifice (245) comprising a liquid outlet (255) within a gas flow passageway (290), the method comp...

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Bibliographische Detailangaben
Hauptverfasser:	MA, YAMIN, DINH, THUC M, LIU, BENJAMIN Y H
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ACTUATING-FLOATS BASIC ELECTRIC ELEMENTS BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COCKS DEVICES FOR VENTING OR AERATING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TAPS THERMAL INSULATION IN GENERAL VALVES WEAPONS
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Beschreibung
Zusammenfassung:	A method for controlling liquid flow through an apparatus comprising an orifice (245) and an adjacent flexible diaphragm (220) separated from each other by a gap (225) through which a liquid flows, the orifice (245) comprising a liquid outlet (255) within a gas flow passageway (290), the method comprising: flexing the diaphragm (220) to vary a size of the gap (225) to control the rate of liquid flowing through the orifice (245) or to provide a positive liquid shutoff of liquid from flowing through the orifice (245); characterised by providing a gas to flow at a velocity higher than approximately 20 meters/second through the gas flow passageway outlet (300) and flowing the gas through the gas outlet (300) in substantially the same direction as the liquid flowing through the liquid outlet (255) to reduce the size of liquid droplets formed at the outlet (255), wherein the outlet (255) is located downstream of the orifice (245) and in fluid communication therewith.