CARTRIDGE-BASED DISPENSING OF NANOSTRUCTURE FILMS

The present disclosure provides systems and methods for storing and dispensing nanostructure material that can maintain the morphology of the nanostructures. The nanostructures are disposed on a flexible substrate that is spooled into a roll. The substrate can be provided with raised edges that spac...

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Bibliographische Detailangaben
Hauptverfasser:	DEGTIAROV, DAVID, A, WILLIAMS, RYAN, D
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBONFILAMENTS APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS,THREADS, FIBRES, BRISTLES OR RIBBONS CHEMISTRY COMBINED OPERATIONS COMPOUNDS THEREOF INORGANIC CHEMISTRY MACHINE TOOLS MEASURING METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY NATURAL OR ARTIFICIAL THREADS OR FIBRES NON-METALLIC ELEMENTS OTHER WORKING OF METAL PERFORMING OPERATIONS PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS SPINNING SPRAYING OR ATOMISING IN GENERAL TESTING TEXTILES TRANSPORTING UNIVERSAL MACHINE TOOLS
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Beschreibung
Zusammenfassung:	The present disclosure provides systems and methods for storing and dispensing nanostructure material that can maintain the morphology of the nanostructures. The nanostructures are disposed on a flexible substrate that is spooled into a roll. The substrate can be provided with raised edges that space adjacent portions from each other in the roll to protect the nanostructures from damage or misalignment. The roll can be provided to a cassette that can be sealed to protect the nanostructure material from exposure to unwanted environments and to protect individuals from exposure to the nanostructure material. The substrate can be unrolled in the cassette to permit the nanostructure material to be applied to an item outside the cassette while maintaining the morphology of the nanostructures. Various controls can be provided to unroll the substrate and deposit the nanostructure material with high precision and repeatability.