POSITION MEASUREMENT SYSTEM AND GRATING FOR A POSITION MEASUREMENT SYSTEM

A position measurement system to determine a position of a first object relative to a second object, includes an encoder head mounted on the first object, a grating mounted on the second object, wherein the grating includes a first array of grating lines in a first direction and a second array of gr...

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Bibliographische Detailangaben
1. Verfasser:	KOENEN, Willem Herman Gertruda Anna
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TARIFF METERING APPARATUS TESTING
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Beschreibung
Zusammenfassung:	A position measurement system to determine a position of a first object relative to a second object, includes an encoder head mounted on the first object, a grating mounted on the second object, wherein the grating includes a first array of grating lines in a first direction and a second array of grating lines in a second direction to diffract a measurement beam incident on the first and second arrays in at least one first diffracted beam in the first direction and in at least one second diffracted beam in the second direction, wherein the first diffracted beam is for position measurement in the first direction and the second diffracted beam is for position measurement in the second direction, wherein the measurement beam has a power quantity, and the grating is configured to distribute the power quantity unevenly over the first and second diffracted beams.