HIGH DIELECTRIC FILM

The present invention aims to provide a film having a high dielectric constant and a low dissipation factor. The high dielectric film of the present invention includes a vinylidene fluoride/tetrafluoroethylene copolymer (A) with a mole ratio (vinylidene fluoride)/(tetrafluoroethylene) of 95/5 to 80/...

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Hauptverfasser: KOH Meiten, YOKOTANI Kouji, KITAHARA Takahiro, IGUCHI Takashi, UCHIDA Kazunobu, SHIGENAI Fumiko, FUKATANI Tomoyuki, KINOSHITA Masakazu, OTA Miharu, NAKAMURA Hisako, ISHIKAWA Takuji, TATEMICHI Mayuko, KOMATSU Nobuyuki, HAZAMA Takeshi, KODANI Tetsuhiro
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:The present invention aims to provide a film having a high dielectric constant and a low dissipation factor. The high dielectric film of the present invention includes a vinylidene fluoride/tetrafluoroethylene copolymer (A) with a mole ratio (vinylidene fluoride)/(tetrafluoroethylene) of 95/5 to 80/20. The film includes an ±-crystal structure and a ²-crystal structure. The ratio of the ²-crystal structure is 50% or more.