Method of detecting arcs in a plasma process and power supply for supplying an output quantity to a plasma process

Method of detecting arcs in a plasma process and power supply for supplying an output quantity to a plasma process

In a Method of detecting arcs in a plasma process which is supplied by a power supply (1) with an output quantity (Uout, Iout, Pout), wherein the output quantity (Uout, Iout, Pout) is compared with an arc detection threshold value (Iarc_thres, Uarc_thres) and an arc is detected if the output quantit...

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Bibliographische Detailangaben
Hauptverfasser: Gieraltowski, Andrzej, Dr Zelechowski, Marcin, Lach, Piotr, Kolasinski, Piotr
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Zusammenfassung:In a Method of detecting arcs in a plasma process which is supplied by a power supply (1) with an output quantity (Uout, Iout, Pout), wherein the output quantity (Uout, Iout, Pout) is compared with an arc detection threshold value (Iarc_thres, Uarc_thres) and an arc is detected if the output quantity (Uout, Iout, Pout) passes the arc detection threshold value (Iarc_thres, Uarc_thres), wherein the arc detection therehold value (Iarc_thres, Uarc_thres) is determined based on at least one set point (Iset, Uset, Pset) for an output quantity.