PROCESS FOR PRODUCING A METALLIC BOROCARBIDE LAYER ON A SUBSTRATE

The invention relates to a PVD process for coating a substrate with a layer containing at least one microcrystalline metallic borocarbide phase. During the PVD process, the source output is pulsed such that the at least one peak of which the half intensity width allows conclusions to be drawn about...

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Bibliographische Detailangaben
Hauptverfasser:	SCHNEIDER, Jochen, ARNDT, Mirjam, BOLVARDI, Hamid, RUDIGIER, Helmut
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a PVD process for coating a substrate with a layer containing at least one microcrystalline metallic borocarbide phase. During the PVD process, the source output is pulsed such that the at least one peak of which the half intensity width allows conclusions to be drawn about the presence of a microcrystalline phase of the metallic borocarbide layer can be identified in the x-ray spectrum of a layer produced in this way at a substrate temperature below 600° C.