IMPRINT DEVICE AND IMPRINT METHOD

An imprint device and an imprint method are provided which form mold patterns on both surfaces of a molding target. An imprint device transfers mold patterns on both surfaces of a molding target 2 using flexible first and second dies 1A, 1B, and the device includes a first casing 33A that applies pr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KAWAGUCHI, Hirosuke, HAGINO, Tatsuya, TANAKA, Satoru
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:An imprint device and an imprint method are provided which form mold patterns on both surfaces of a molding target. An imprint device transfers mold patterns on both surfaces of a molding target 2 using flexible first and second dies 1A, 1B, and the device includes a first casing 33A that applies pressure of a first pressurizing room 30A to the die 1A and the molding target 2, a second casing 33B that applies pressure of a second pressurizing room 30B to the die 1B and the molding target 2, a pressurizer 35 that adjusts the pressures of the pressurizing room 30A and the pressurizing room 30B, a first moving unit that moves the die 1A and the molding target 2 in a direction coming close to or distant from each other, a second moving unit that moves the die 1B and the molding target 2 in a direction coming close to or distant from each other, a depressurizer 45 that depressurizes a depressurizing room 40 formed between the casing 33A and the casing 33B, and eliminates fluids present between the die 1A and the molding target 2 and between the die 1B and the molding target 2, and a pressure adjuster that adjusts pressures so as to reduce pressure differences between the depressurizing room 40 and the pressurizing room 30A, the pressurizing room 30B.