PHOTOSENSITIVE RESIN COMPOSITION AND ANTIREFLECTION FILM

Problem To provide: A photosensitive resin compostion which is cured by radiation and exhibits excellent wear resistance, antifouling properties, marker pen ink wiping-off properties, fingerprint wiping-off properties and low refractive index, and which provides low reflectance in cases where the ph...

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Bibliographische Detailangaben
Hauptverfasser:	NAKASHIMA RYOTA, TAIRA YOSHIHIKO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ADVERTISING CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CRYPTOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DISPLAY DISPLAYING EDUCATION FREQUENCY-CHANGING LABELS OR NAME-PLATES LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICS SEALS SIGNS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING
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Beschreibung
Zusammenfassung:	Problem To provide: A photosensitive resin compostion which is cured by radiation and exhibits excellent wear resistance, antifouling properties, marker pen ink wiping-off properties, fingerprint wiping-off properties and low refractive index, and which provides low reflectance in cases where the photosensivive resin composition is used for an antireflection film; and an antireflection film which has a cured coating film of this photosensitive resin composition. Solution A photosensitive resin composition for an antireflection film that is characterized in that a low refractive index layer contains an acrylate, a colloidal silica, and an organic modified dimethyl polysiloxane having an acryloyl group and an acrylate-modified perfluoropolyether that serve as surface modification agents; and an antireflection film which is obtained by curing the photosensitive resincomposition.