APPARATUS FOR GENERATING AND MAINTAINING PLASMA FOR PLASMA PROCESSING

An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling...

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Hauptverfasser: GOLAN, Marcin, KLIMCZAK, Andrzej, ZELECHOWSKI, Marcin, OZIMEK, Pawel
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling RF power from the inductance into a plasma chamber.