APPARATUS FOR GENERATING AND MAINTAINING PLASMA FOR PLASMA PROCESSING
An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling RF power from the inductance into a plasma chamber. |
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