METHOD FOR PRODUCING AT LEAST ONE COMPONENT AND OPEN-LOOP AND/OR CLOSED-LOOP CONTROL DEVICE

The disclosure relates to a method for producing at least one, in particular metal, component, preferably a cylinder head, a nozzle body for a high-pressure injection pump, a component of a diesel injection engine, or a throttle disk, by means of low-pressure carbonitriding in at least one treatment...

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Bibliographische Detailangaben
Hauptverfasser:	REIMERT, Rainer, BAJOHR, Siegfried, KOCH, David, BUCHHOLZ, Dominic, WALDENMAIER, Thomas, HAGYMASI, Laszlo
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The disclosure relates to a method for producing at least one, in particular metal, component, preferably a cylinder head, a nozzle body for a high-pressure injection pump, a component of a diesel injection engine, or a throttle disk, by means of low-pressure carbonitriding in at least one treatment chamber, which preferably can be evacuated, and an open-loop and/or closed-loop control device, which enables the setting of a specified ratio between a carbon concentration and a nitrogen concentration in a surface layer of the at least one component. In at least one treatment phase, a carbon-providing gas and a nitrogen-providing gas are simultaneously introduced into the treatment chamber. Based on a specified ratio between a carbon concentration and a nitrogen concentration to be absorbed by the at least one component in a surface layer of the component, a target value for the temperature and/or the pressure to be set in the treatment chamber is determined and is set in the treatment chamber for a specified time.