METHOD AND DEVICE FOR PUMPING OF A PROCESS CHAMBER

A pumping device intended to be connected to a process chamber (2) includes a dry primary vacuum pump, an auxiliary pump mounted so that the auxiliary pump bypasses a check valve on the vacuum pump, a first valve device connected to a purging device for purging the dry primary vacuum pump and intend...

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Bibliographische Detailangaben
1. Verfasser:	SEIGEOT, Bertrand
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BLASTING HEATING LIGHTING MECHANICAL ENGINEERING POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BYUSING INERTIA OF FLUID TO BE PUMPED PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTMACHINES FOR LIQUIDS ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENTPUMPS SIPHONS WEAPONS
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Beschreibung
Zusammenfassung:	A pumping device intended to be connected to a process chamber (2) includes a dry primary vacuum pump, an auxiliary pump mounted so that the auxiliary pump bypasses a check valve on the vacuum pump, a first valve device connected to a purging device for purging the dry primary vacuum pump and intended to be connected to a gas supply, a second valve device mounted so that the second valve device bypasses a check valve upstream from the auxiliary pump, and a controller configured to control the first and second valve devices on the basis of an operating status of the process chamber in such a way that the first valve device is at least partially closed and the second valve device is open when the process chamber is operating at ultimate vacuum. Also a method for pumping of a process chamber by way of such a pumping device.