METHOD FOR THE OPTICAL MEASUREMENT OF PYRAMIDS ON TEXTURED MONOCRYSTALLINE SILICON WAFERS

The invention relates to a method for the optical survey of pyramids (2) on surface-textured monocrystalline silicon wafers (1) wherein by using at least one light source (4) and at least one light receiver (5) the light (7) bent on the pyramids is received for determining geometric characteristics...

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Bibliographische Detailangaben
1. Verfasser:	KUBITZEK, Rüdiger
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	The invention relates to a method for the optical survey of pyramids (2) on surface-textured monocrystalline silicon wafers (1) wherein by using at least one light source (4) and at least one light receiver (5) the light (7) bent on the pyramids is received for determining geometric characteristics of the pyramids. Regardless from the latter or also in addition to the latter, light (9) that is scattered in a forward direction is optionally measured with a further light receiver (8) and the degree to which the surface of the silicon wafer is covered with pyramids is determined.