SELECTIVE AND/OR FASTER REMOVAL OF A COATING FROM AN UNDERLYING LAYER, AND SOLAR CELL APPLICATIONS THEREOF

SELECTIVE AND/OR FASTER REMOVAL OF A COATING FROM AN UNDERLYING LAYER, AND SOLAR CELL APPLICATIONS THEREOF

A method for patterning a film pattern on a substrate includes forming a film pattern on a substrate surface, forming a coating over the substrate and the film pattern and inducing porosity or openings in the coating. At least a part of the coating overlying the film pattern is removed including etc...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ONG, QING YUAN, TURNER, ADRIAN BRUCE
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method for patterning a film pattern on a substrate includes forming a film pattern on a substrate surface, forming a coating over the substrate and the film pattern and inducing porosity or openings in the coating. At least a part of the coating overlying the film pattern is removed including etching at least one layer underlying the coating ahead of removing at least part of the coating.