TWO-STEP METHOD FOR JOINING A SEMICONDUCTOR TO A SUBSTRATE WITH CONNECTING MATERIAL BASED ON SILVER

The invention relates to a method for joining a semiconductor (20) to a substrate (10), comprising the following steps: *applying a first paste layer (1) of a sintering paste to the substrate; *heating and compressing the first paste layer to form a first sintered layer; *applying a second paste lay...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: FRUEH, CHRISTIANE, HERBOTH, THOMAS, GUENTHER, MICHAEL
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The invention relates to a method for joining a semiconductor (20) to a substrate (10), comprising the following steps: *applying a first paste layer (1) of a sintering paste to the substrate; *heating and compressing the first paste layer to form a first sintered layer; *applying a second paste layer (2) of a sintering paste to the first sintered layer and arranging a semiconductor (20) on the second paste layer; *heating and compressing the second paste layer (2) to form a second sintered layer. The invention further relates to a semiconductor component produced by means of the method.