TWO-STEP METHOD FOR JOINING A SEMICONDUCTOR TO A SUBSTRATE WITH CONNECTING MATERIAL BASED ON SILVER
The invention relates to a method for joining a semiconductor (20) to a substrate (10), comprising the following steps: *applying a first paste layer (1) of a sintering paste to the substrate; *heating and compressing the first paste layer to form a first sintered layer; *applying a second paste lay...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The invention relates to a method for joining a semiconductor (20) to a substrate (10), comprising the following steps: *applying a first paste layer (1) of a sintering paste to the substrate; *heating and compressing the first paste layer to form a first sintered layer; *applying a second paste layer (2) of a sintering paste to the first sintered layer and arranging a semiconductor (20) on the second paste layer; *heating and compressing the second paste layer (2) to form a second sintered layer. The invention further relates to a semiconductor component produced by means of the method. |
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