Plasmonic interface and method of manufacturing thereof

A method 30 of manufacturing a layered material stack 10 that includes a plasmonic interface between a plasmonic material 12 and optical waveguide material 18 is disclosed. The method includes providing 32 a substrate layer 14, disposing a layer of plasmonic material 12 on the substrate layer 14, de...

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Bibliographische Detailangaben
Hauptverfasser:	HEWGLEY, JOHN BRIAN, BECERRA, JUAN JOSE, KEIMEL, CHRISTOPHER FRED
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS TRANSPORTING
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Beschreibung
Zusammenfassung:	A method 30 of manufacturing a layered material stack 10 that includes a plasmonic interface between a plasmonic material 12 and optical waveguide material 18 is disclosed. The method includes providing 32 a substrate layer 14, disposing a layer of plasmonic material 12 on the substrate layer 14, depositing 36 a metal constituent of an optical waveguide material 22 directly onto the layer of plasmonic material 12, and anodizing 38 the metal constituent of the optical waveguide material 22 to form an optically transparent oxide of the metal constituent configured to couple light into the layer of plasmonic material 12, with the optically transparent oxide of the metal constituent forming an optical waveguide structure 18.