SELF-ALIGNED STACK GATE STRUCTURE FOR USE IN A NON-VOLATILE MEMORY ARRAY

A stack gate structure for a non-volatile memory array has a semiconductor substrate having a plurality of substantially parallel spaced apart active regions, with each active region having an axis in a first direction. A first insulating material is between each stack gate structure in the second d...

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Hauptverfasser: SU, CHIEN-SHENG, CUEVAS, LIZ, WEGE, STEPHAN, BERNARDI, CECILE, MIRIDI, NADIA, GUYOT, FLORENCE, TADAYONI, MANDANA, DO, NHAN, OM'MANI, HENRY, CHEN, YUEH-HSIN, LIU, XIAN, TOREN, WILLEM-JAN, METZGER-BRUECKL, GERHARD
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A stack gate structure for a non-volatile memory array has a semiconductor substrate having a plurality of substantially parallel spaced apart active regions, with each active region having an axis in a first direction. A first insulating material is between each stack gate structure in the second direction perpendicular to the first direction. Each stack gate structure has a second insulating material over the active region, a charge holding gate over the second insulating material, a third insulating material over the charge holding gate, and a first portion of a control gate over the third insulating material. A second portion of the control gate is over the first portion of the control gate and over the first insulating material adjacent thereto and extending in the second direction. A fourth insulating material is over the second portion of the control gate.