METHOD FOR DEPOSITING A LIPON LAYER ON A SUBSTRATE

A method for depositing a LiPON coating on a substrate is provided, wherein the vaporization material, which is located in a vessel and which includes at least the chemical elements lithium, phosphorus and oxygen, is vaporized within a vacuum chamber. Here the vaporization material is heated by mean...

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Bibliographische Detailangaben
Hauptverfasser:	FAHLAND, MATTHIAS, MEYER, BJÖRN, GÜNTHER, STEFFEN, MORGNER, HENRY, STRAACH, STEFFEN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method for depositing a LiPON coating on a substrate is provided, wherein the vaporization material, which is located in a vessel and which includes at least the chemical elements lithium, phosphorus and oxygen, is vaporized within a vacuum chamber. Here the vaporization material is heated by means of a thermal vaporization apparatus, and simultaneously either a nitrogen-containing component is introduced into the vacuum chamber or a nitrogen-containing material is co-vaporized, and wherein the vapor particle mist rising from the vessel is permeated by a plasma before the deposition on the substrate.